Large-Area Fabrication-Aware Computational Diffractive Optics
Abstract
Differentiable optics, as an emerging paradigm that jointly optimizes optics and (optional) image processing algorithms, has made innovative optical designs possible across a broad range of applications. Many of these systems utilize diffractive optical components (DOEs) for holography, PSF engineering, or wavefront shaping. Existing approaches have, however, mostly remained limited to laboratory prototypes, owing to a large quality gap between simulation and manufactured devices. We aim at lifting the fundamental technical barriers to the practical use of learned diffractive optical systems. To this end, we propose a fabrication-aware design pipeline for diffractive optics fabricated by direct-write grayscale lithography followed by nano-imprinting replication, which is directly suited for inexpensive mass production of large area designs. We propose a super-resolved neural lithography model that can accurately predict the 3D geometry generated by the fabrication process. This model can be seamlessly integrated into existing differentiable optics frameworks, enabling fabrication-aware, end-to-end optimization of computational optical systems. To tackle the computational challenges, we also devise tensor-parallel compute framework centered on distributing large-scale FFT computation across many GPUs. As such, we demonstrate large scale diffractive optics designs up to 32.16 mm × 21.44 mm, simulated on grids of up to 128,640 by 85,760 feature points. We find adequate agreement between simulation and fabricated prototypes for applications such as holography and PSF engineering. We also achieve high image quality from an imaging system comprised only of a single DOE, with images processed only by a Wiener filter utilizing the simulation PSF. We believe our findings lift the fabrication limitations for real-world applications of diffractive optics and differentiable optical design.
Physical Origins of Design-to-Manufacturing Gap
Step-by-Step Illustration of the Fabrication Pipeline, the direct-write grayscale lithography followed by nano-imprinting replication, a process employed today for mass production of large-area devices. Due to the sophisticated photolithography process, 3-D optical proximity effects as well as the complex photochemical interaction render significant deviations from design to manufacturing.
Fabrication-Aware End-to-End Design of Diffractive Optical Systems
Fabrication-Aware Image Formation Model. Unlike most existing works that largely ignore the manufacturing process and assume the designed DOE can be fabricated as it is, We model the sophisticated fabrication process, the significant deviations from design to manufacturing with a neural lithography model, enabling joint optical design and fabrication correction end-to-end.
Distributed Computing Framework for Large-scale Wave Optics Simulation
Results in Computational Holographic Display


Conventional Design


Fabrication-Aware Design
Results in Single-DOE Broadband Color Imaging

Conventional Design

Fabrication-Aware Design

Conventional Design

Fabrication-Aware Design

Conventional Design

Fabrication-Aware Design

Conventional Design

Fabrication-Aware Design

Conventional Design

Fabrication-Aware Design

Conventional Design

Fabrication-Aware Design

Conventional Design

Fabrication-Aware Design
Real-life Experimental Demonstrations
Experimental demonstrations of the diffractive optical elements (DOE) designed by our proposed fabrication-aware optimization framework for applications in computational holographic display and single-DOE broadband imaging.
BibTeX
@article{Wei2025LAFA,
author = {Kaixuan Wei and Hector A. Jimenez-Romero and Hadi Amata and Jipeng Sun and Qiang Fu and Felix Heide and Wolfgang Heidrich},
title = {Large-Area Fabrication-aware Computational Diffractive Optics},
journal = {ACM Transactions on Graphics (TOG)},
year = {2025},
volume = {44},
number = {6},
articleno = {243},
month = {dec},
doi = {10.1145/3763358},
publisher = {ACM}
}